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Patent Summary.  Most of these patents have corresponding overseas filings and/or issued patents. Most are licensed for active commercial applications.

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1.     US 4,980,556     Apparatus for generating high currents of negative ions. O'Connor and White, 1990.

2.     US 5,126,575     Method and Apparatus for Broad Beam Implantation., White, 1992.

3.     US 5,350,926     Compact High Current Broad Beam ion Implanter, White, Sieradzki and Renau, 1994.

4.     US 5,834,786     High Current Ribbon Beam ion Implanter, White and Sieradzki, 1998.

5.     US 5,822,172     Apparatus and Method for Temperature Control of Workpieces in Vacuum. White, 1998.

6.     US 6,521,895     Wide dynamic range beam scanners.  Walther and White, 2003.
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7.     US 6,696,688     Apparatus for magnetically scanning and/or switching a charged particle beam. White, Bell, Harvey, 2003.

8.     US 6,998,625     McKenna, White, Brown, Bell, Radovanov.  Ion Implanter having two-stage deceleration beamline, 2006.

9.     US 7,059,817     Wafer Handling Apparatus and Method, White and Sieradzki, 2006.

10.   US 7,057,192     Radial scan arm and Collimation for Serial processing of Semiconductor Wafers with Ribbon Beams. Kaim and White, 2006.

11.   US 7,078,713     Electromagnetic regulator assembly for adjusting and controlling the current uniformity of continuous ion beams. White, 2006.

12.   US 7,105,839.    Method and fine-control collimator for accurate collimation and precise parallel alignment of scanned beams.  White. 2006.

13.   US 7,112,789.     High Aspect Ratio, High Mass Resolution Analyzer Magnet and System for Ribbon Ion Beams. White and Chen, 2006.

14.   US 7,326,941.    Apparatus and Methods for ion Implantation using Ribbon and Spot Beams.  White and Chen, 2006

15.    US 7,462,843.    Apparatus and Methods for Ion beam Implantation. White and Chen, 2008.

16.  US 7,740,247.     Compound sliding seal unit suitable for atmosphere to vacuum applications , White and McRay, 2010.

17.  20100001204  .   Open-ended electromagnetic corrector assembly and method for deflecting, focusing, and controlling the uniformity of a traveling ion beam.  White, 2009