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Ionex/HEI/Genus Source

I have always had a particular liking for this source, for its simplicity and lightness. It was used on the Genus 1500 and 1520 high-energy implanters using tandem accelerators. The tolerances were loose because the tip of the arc chamber self-aligned into the source mounting flange. It was very inexpensive to manufacture and easy to service. It generated 27 mA of analyzed argon beam at 35 keV through a 1/4" diameter hole. That's pretty good current density by any measure montblanc replica.

A solenoid was mounted around the arc chamber. This is a PIG source with the positive ions extracted from the end of the plasma column, not the side.

This source was designed to be close-coupled with a charge-exchange cell using magnesium vapor, and generated up to 1.5mA of P-. This was the first instance of reliable milliampere beams of heavy negative ions. The following diagram shows the configuration - but with apologies for the quality!
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